製品情報
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NP-TM2
Nonionic photoacid generator for i-line.
It has excellent solvent solubility and high heat resistance.
Although it has a low molar extinction coefficient (high transparency),
it exhibits a high acid generation rate.
 |
|
| CAS RN® | Non-disclosure |
|---|---|
| M.W. | Approx. 500 |
Physical characteristics / Packing / Development stage
| Appearance | White powder～yellow powder |
|---|---|
| Packing |
0.5kgBottle |
| Stage | Labo |
| Sample | Free：10g |
Q&A
- What is the absorption wavelength?
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The molar extinction coefficient at i-line(365nm) is 2,300 [M-1 cm-1] .There is no absorption in the h-line(405nm) and g-line (436 nm).
- How soluble is it in solvents.
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It dissolves about 25 wt% in PGMEA and about 25 wt% in γ-butyrolactone.
- What is the resistance to amine compounds?
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It is highly stable even in the presence of pyridine.
- Are there different acid types?
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There is no development record. If you have a desired acid type, please feel free to contact us.
- How much should I add?
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Add about 0.5 to 3 wt% to the resin, depending on the application and film thickness.
- What film thickness is suitable?
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It has a low molar extinction coefficient at 365 nm and high permeability, making it suitable for use on thick films (50 μm and above).Of course, it can also be used with a thin film.
