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NP-SE10

Nonionic photoacid generator for i-line, h-line, and g-line.

It has excellent solvent solubility and high heat resistance.

It absorbs at higher wavelengths than NP-TM2 and shows a higher acid generation rate.

CAS RN® Non-disclosure
M.W. Approx. 600

Physical characteristics / Packing / Development stage

Appearance Yellow powder
Packing

0.5kgBottle

Stage Labo
Sample Free:10g


Q&A

What is the absorption wavelength?
The NP-SE10 absorbs i-line (365 nm), h-line(405nm), and g-line(436nm). The molar extinction coefficient at each wavelength are 10,000 [M-1 cm-1] (@365nm), 10,000 [M-1 cm-1](@405nm), and 400 [M-1 cm-1](@436nm).
How soluble is it in solvents.
It dissolves about 35 wt% in PGMEA and about 30 wt% in γ-butyrolactone.
What is the resistance to amine compounds?
It dissolves about 35 wt% in PGMEA and about 30 wt% in γ-butyrolactone.
Are there different acid types?
There is no development record. If you have a desired acid type, please feel free to contact us.
How much should I add?
Add about 0.5 to 3 wt% to the resin, depending on the application and film thickness.
 What film thickness is suitable?
Suitable for 1 to 50 μm, depending on the exposure wavelength and the type of composition used.